arXiv — cs.AI preprintsInternational16 October 2026
GNN-Guided Local Refinement for Efficient Layout Decomposition with DSA-MP
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arXiv:2610.22214v1 Announce Type: new Abstract: Multiple patterning lithography (MPL) has been widely used to improve lithography resolution in advanced nodes, but it faces cost limits as feature sizes shrink. Directed self-assembly (DSA) offers a cost-effective complement, extending the resolution of optical lithography to sub-10 nm and beyond. Integrating DSA into MPL (DSA-MP) further enhances the resolution of contact/via patterning. Nevertheless, growing design complexity exposes the limits of existing decomposition methods, which struggle to balance solution quality and runtime, and negle
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